Chemical Engineering Journal [IF 15.1 - JCR Rank 3.57% in ENGINEERING, CHEMICAL]
F. Zafar, R. Zhao, M. Ali, Y. Min Park, H.-S. Roh, X. Gao, J. Tian, J. Wook Bae
https://doi.org/10.1016/j.cej.2022.135649
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